|
|
|
Name: |
LI Tong 李同 |
|
Department: |
Division of Nano-devices & Materials |
|
Position: |
Professor |
|
Expertise: |
Integrated optics; Flat Panel Display technology; Optical communications; Thin film based devices |
|
Email: |
tli2008@sinano.ac.cn |
|
|
| Research Interest: |
1. Novel components and modules for flat panel display;
2. Optical components and modules for photovoltaic systems;
3. Thin film devices;
4. Solid state laser.
|
| Experience: |
Employment
|
Jul. 2008 - Present
|
Professor
|
Division of Nano-Devices and Materials, SINANO, CAS
|
|
Apr. 2004 - Jun. 2008
|
President and CEO
|
Ningbo Starley Co. Ltd., China
|
|
Oct. 2003 - Mar. 2004
|
Consultant
|
LuminTek, U.S.A.
|
|
Oct. 2000 - Sep. 2003
|
Senior Process Engineer
|
Chorum Technologies, U.S.A.
|
|
Sep. 1999 - Sep. 2000
|
Senior Device Engineer
|
Ball Semiconductor Inc., U.S.A.
|
|
Jul, 1983- Aug. 1990
|
Engineer
|
Shaanxi Institute of Metrology, China
|
Education
|
Ph.D. 1999
|
Electrical Engineering and Computer Sciences
|
University of Michigan, Ann Arbor, U.S.A.
|
|
M.S. 1993
|
Electrical and Computer Engineering
|
Wayne State University, U.S.A.
|
|
B.S. 1983
|
Optical Engineering
|
Shanghai Institute of Mechanical Engineering
|
|
| Selected Publication: |
-
S. Martin, C.-S. Chiang, J.-Y. Nahm, Tong Li, J. Kanichi, and Y. Ugai, Influence of the Amorphous Silicon Thickness on Top Gate Thin-Film Transistor Electrical Performances. Japan Journal of Applied Physics (2001), 40, 530-537.
-
Tong Li, J. Kanicki, W. Kong and F.L. Terry, Interference Fringe-Free Transmission Spectroscopy of Amorphous Thin Films, Journal of Applied Physics (2000), 88, 5764-5771.
-
Tong Li, and J. Kanicki, Microstructure Characterization of Hydrogenated Amorphous Thin Films in a Fringe-Free Environment, Journal of Applied Physics (1999), 85, 388.
-
Tong Li, J. Kanicki, and C. Mohler, Method of Collecting Pure Vibrational Absorption Spectra of Amorphous Thin Films, Thin Solid Films (1999), 349, 283.
-
Tong Li, and J. Kanicki, Observation of Angle Dependent Phonon Absorption in Hydrogenated Amorphous Silicon Nitride Thin Films, Applied Physics Letters (1998), 73, 3866.
-
Tong Li, and J. Kanicki, Longitudinal Vibrational Absorption Modes of Hydrogenated Amorphous Silicon Nitride Thin Films, Material Research Society Symposium Proceedings (1998), 507, 535.
-
Tong Li, C. Y. Chen, C. T. Malone, and J. Kanicki, High-Rate Deposited Amorphous Silicon Nitride for the Hydrogenated Amorphous Silicon Thin-Film Transistor Structures, Material Research Society Symposium Proceedings (1996), 424, 43.
-
Tong Li, J. Kanicki, M. Fitzner, and W. L. Warren, Investigation of Hydrogen Evolution and Dangling Bonds Creation Mechanism in Amorphous Silicon Nitride Thin Films, AMLCDs ’95 (1995), 123.
-
R. Arrathoon, J. Arshad, Tong Li, T. W. Lin, and B. Zhang, Optoelectronic Wide-Word Personality ROM’s for High-Speed Control Applications, Hybrid Image and Signal Processing III (1992), David P. Casasent, Andrew G. Tescher, Editors, Proc. SPIE. 1702, 200.
|
|
